User contributions for Csmiller
Jump to navigation
Jump to search
June 3, 2021
- 19:3519:35, June 3, 2021 diff hist −168 Nanofabrication →Nanofabrication current
- 19:1619:16, June 3, 2021 diff hist −15 Nanofabrication Undo revision 6935 by Csmiller (talk) Tag: Undo
- 19:1419:14, June 3, 2021 diff hist +15 Nanofabrication →Nanofabrication
- 19:1119:11, June 3, 2021 diff hist +159 Patterning →Patterning current
- 19:0819:08, June 3, 2021 diff hist +100 Patterning →Patterning
- 19:0519:05, June 3, 2021 diff hist +22 Patterning →Patterning
- 19:0319:03, June 3, 2021 diff hist −3 Nanofabrication/Equipment/MA6 →Features current
- 19:0219:02, June 3, 2021 diff hist +1,116 N MA6 Created page with "== Features == * Front Side Alignment / Front to Back side Alignment * Exposure Optics: UV400 Lamp 350 Watts * UV lamp spectral Lines (nanometers): ** 436 g-line ** 405 h-li..." current
- 19:0119:01, June 3, 2021 diff hist −10 Nanofabrication/Equipment/MA6 →MA6/BA6 Contact Aligner
June 2, 2021
- 20:3420:34, June 2, 2021 diff hist +7 Nanofabrication →test new
- 20:3320:33, June 2, 2021 diff hist −76 Nanofabrication →CNM Cleanroom
- 20:3220:32, June 2, 2021 diff hist +2,461 N Photoresist Created page with " :Kayakuam :[https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists,..." current
- 20:2820:28, June 2, 2021 diff hist +17 Patterning →Patterning
- 20:2720:27, June 2, 2021 diff hist −17 Patterning →Patterning
- 20:2720:27, June 2, 2021 diff hist +17 Patterning →Patterning
- 20:2620:26, June 2, 2021 diff hist −70 Nanofabrication →CNM Cleanroom
- 20:2520:25, June 2, 2021 diff hist +16 Nanofabrication →test new
- 20:2420:24, June 2, 2021 diff hist −69 Nanofabrication →CNM Cleanroom
June 1, 2021
- 21:3321:33, June 1, 2021 diff hist +2 Nanofabrication →test new
- 21:3021:30, June 1, 2021 diff hist +117 N Hotplate Created page with "* Optical Hotplates ** Typical temperatures are 90C and 115C *EBL Hotplate ** Typical Temperatures are 150C and 180C" current
- 21:2821:28, June 1, 2021 diff hist +125 N Ovens Created page with "* YES Oven ** Adhesion promotion ** Vacuum Bake * Image Reversal ** Reversal positive photoresist to negative ** vacuum bake" current
- 21:1821:18, June 1, 2021 diff hist −69 Patterning →Patterning
- 21:1521:15, June 1, 2021 diff hist −27 Patterning →Patterning
- 21:1321:13, June 1, 2021 diff hist +216 Patterning →Patterning
- 21:0821:08, June 1, 2021 diff hist +41 Patterning →Patterning
- 21:0121:01, June 1, 2021 diff hist +47 N Patterning Created page with "== Patterning == <gallery> File:LaserWriter.jpg"
- 20:4520:45, June 1, 2021 diff hist +96 Nanofabrication No edit summary
- 20:3720:37, June 1, 2021 diff hist +23 Nanofabrication →CNM Cleanroom
January 29, 2021
- 00:4000:40, January 29, 2021 diff hist +21 Nanofabrication/Equipment/Wafer Dicing Saw →Dicing Saw current
January 8, 2021
- 21:4721:47, January 8, 2021 diff hist +403 Nanofabrication/Equipment/Wafer Dicing Saw →Dicing Saw
December 7, 2020
- 16:2216:22, December 7, 2020 diff hist +25 Nanofabrication/Equipment/Filmetrics No edit summary current
- 16:1216:12, December 7, 2020 diff hist +57 Nanofabrication/Equipment/Filmetrics No edit summary
- 15:3615:36, December 7, 2020 diff hist 0 N File:Filmetrics.jpg No edit summary current
- 15:1115:11, December 7, 2020 diff hist −5 Nanofabrication/Equipment/Filmetrics →User Proposal Feasibility
- 15:1015:10, December 7, 2020 diff hist +191 N Nanofabrication/Equipment/Filmetrics Created page with "==Features== ===User Proposal Feasibility=== When requesting the use of this instrument, please provide the following information in your user proposal: * Sample materials..."
- 15:0815:08, December 7, 2020 diff hist +63 Nanofabrication/Equipment →Metrology current
November 25, 2020
- 17:2817:28, November 25, 2020 diff hist +1 Nanofabrication/Equipment Undo revision 6737 by Csmiller (talk) Tag: Undo
- 17:2717:27, November 25, 2020 diff hist −1 Nanofabrication/Equipment →Plasma and Reactive Ion Etching
- 17:2617:26, November 25, 2020 diff hist +78 Nanofabrication/Equipment →Plasma and Reactive Ion Etching
- 17:2317:23, November 25, 2020 diff hist +315 Nanofabrication/Equipment/Oxford ICP etching system No edit summary current
- 17:2117:21, November 25, 2020 diff hist +33 Nanofabrication/Equipment/Oxford ICP etching system No edit summary
- 17:1817:18, November 25, 2020 diff hist −4 Nanofabrication/Equipment/Oxford ICP etching system →Features
- 17:1717:17, November 25, 2020 diff hist +61 Nanofabrication/Equipment/Oxford ICP etching system No edit summary
- 17:1517:15, November 25, 2020 diff hist +25 Nanofabrication/Equipment/REACTIVE ION ETCHERS No edit summary current
- 17:1417:14, November 25, 2020 diff hist +1,259 N Nanofabrication/Equipment/Oxford ICP etching system Created page with "===Features=== :PlasmaLab System 100 (Oxford Instruments) located in C122. The system comprises two process stations (Process Station 1 (ICP 180) dedicated to chlorine-based e..."
- 17:1117:11, November 25, 2020 diff hist −16 Nanofabrication/Equipment →Plasma and Reactive Ion Etching
- 17:0717:07, November 25, 2020 diff hist −30 Nanofabrication/Equipment/Oxford ICP and RIE etching system No edit summary current
- 17:0517:05, November 25, 2020 diff hist 0 N File:ICPRIE.JPG No edit summary current
- 16:5116:51, November 25, 2020 diff hist −18 Nanofabrication/Equipment/REACTIVE ION ETCHERS No edit summary
- 16:5016:50, November 25, 2020 diff hist 0 N File:March1.jpg No edit summary current
- 16:4816:48, November 25, 2020 diff hist +337 Nanofabrication/Equipment/REACTIVE ION ETCHERS No edit summary
- 16:4716:47, November 25, 2020 diff hist −7 Nanofabrication/Equipment/REACTIVE ION ETCHERS No edit summary
November 24, 2020
- 20:0820:08, November 24, 2020 diff hist +105 Nanofabrication/Equipment/Wafer Dicing Saw No edit summary
- 19:5119:51, November 24, 2020 diff hist −228 Nanofabrication/Equipment/Critical Point Dryer No edit summary current
- 19:3019:30, November 24, 2020 diff hist +2 Nanofabrication/Equipment/FIB No edit summary current
- 19:2619:26, November 24, 2020 diff hist 0 N File:CPD.JPG No edit summary current
- 19:1819:18, November 24, 2020 diff hist −308 Nanofabrication/Equipment/FIB No edit summary
- 19:1219:12, November 24, 2020 diff hist +81 Nanofabrication/Photoresist No edit summary current
- 19:1019:10, November 24, 2020 diff hist +132 Nanofabrication/Photoresist No edit summary
- 19:0619:06, November 24, 2020 diff hist +5 Nanofabrication/Photoresist No edit summary
- 19:0519:05, November 24, 2020 diff hist +88 Nanofabrication/Photoresist No edit summary
- 19:0319:03, November 24, 2020 diff hist +81 Nanofabrication/Photoresist No edit summary
- 19:0119:01, November 24, 2020 diff hist +103 Nanofabrication/Photoresist No edit summary
- 18:5918:59, November 24, 2020 diff hist +85 Nanofabrication/Photoresist No edit summary
- 18:5818:58, November 24, 2020 diff hist −70 Nanofabrication/Photoresist No edit summary
- 18:5618:56, November 24, 2020 diff hist −443 Nanofabrication/Photoresist No edit summary
- 18:5118:51, November 24, 2020 diff hist +35 Nanofabrication/Photoresist No edit summary
November 23, 2020
- 21:1421:14, November 23, 2020 diff hist +55 Nanofabrication/Equipment/HVEBL No edit summary current
- 21:1221:12, November 23, 2020 diff hist +540 Nanofabrication/Equipment/HVEBL No edit summary
- 21:1221:12, November 23, 2020 diff hist +540 Nanofabrication/Equipment/MLA No edit summary current
- 21:1021:10, November 23, 2020 diff hist +52 Nanofabrication/Equipment/Interferometric No edit summary current
- 21:0921:09, November 23, 2020 diff hist −134 Nanofabrication/Equipment/Interferometric No edit summary
- 21:0621:06, November 23, 2020 diff hist 0 N File:Orange Box.jpg No edit summary current
- 21:0421:04, November 23, 2020 diff hist +36 Nanofabrication/Equipment/LVEBL No edit summary current
- 21:0321:03, November 23, 2020 diff hist +610 N Nanofabrication/Equipment/LVEBL Created page with "==Raith 30 KV Ebeam Lithography System== The Raith is a 30KV electron beam lithography tool. right|400px ===Features=== * 30 kV electron beam colum..."
- 21:0321:03, November 23, 2020 diff hist 0 N File:IMG 0045.JPG No edit summary current
- 21:0121:01, November 23, 2020 diff hist 0 N File:IMG 0996.JPG No edit summary current
- 20:5920:59, November 23, 2020 diff hist +35 N Nanofabrication/Equipment/HVEBL Created page with "<gallery> IMG 0993.JPG </gallery>"
- 20:5820:58, November 23, 2020 diff hist +18 N File:IMG 0993.JPG JEOL current
- 20:5720:57, November 23, 2020 diff hist −6 Nanofabrication/Photoresist No edit summary
- 20:5320:53, November 23, 2020 diff hist −85 Nanofabrication/Equipment/Wafer Dicing Saw No edit summary
- 20:5120:51, November 23, 2020 diff hist +1 Nanofabrication/Equipment/Wafer Dicing Saw No edit summary
- 20:3420:34, November 23, 2020 diff hist +2 Nanofabrication/Equipment/ICP-CVD Deposition System No edit summary current
- 20:3320:33, November 23, 2020 diff hist +21 N File:IMG 0941.JPG ICP CVD current
- 20:2720:27, November 23, 2020 diff hist +1,024 N Nanofabrication/Equipment/ Metal Sputter System Created page with "== AJA Sputter System (metals)== right|400px| The instrument is located in the clean room, File:Smallaja2.JPG|right|400px| The instrument is located..." current
- 20:2420:24, November 23, 2020 diff hist +7 Nanofabrication/Equipment →Deposition
- 20:2320:23, November 23, 2020 diff hist +10 Nanofabrication/Equipment →Deposition
- 20:2220:22, November 23, 2020 diff hist +23 N File:IMG 0974.JPG Small AJA current
- 20:2120:21, November 23, 2020 diff hist +1 Nanofabrication/Equipment/AJA Oxide Sputter System No edit summary current
- 20:2120:21, November 23, 2020 diff hist +23 N File:IMG 0970.JPG AJA Oxide current
- 20:1620:16, November 23, 2020 diff hist +232 N Nanofabrication/Equipment/Surface Profilometer Created page with "right|400px| ==Features== ===User Proposal Feasibility=== When requesting the use of this instrument, please provide the following information in y..." current
- 20:1520:15, November 23, 2020 diff hist +25 N File:IMG 0962.JPG TencorP7 3d current
- 20:0220:02, November 23, 2020 diff hist +549 Nanofabrication/Equipment/Wafer Dicing Saw No edit summary
- 19:5819:58, November 23, 2020 diff hist +13 Nanofabrication/Equipment/Wafer Dicing Saw No edit summary
- 19:5519:55, November 23, 2020 diff hist +77 N Nanofabrication/Equipment/Wafer Dicing Saw Created page with "<gallery> IMG 0956.JPG |Wafer Mounting System Example.jpg|Caption2 </gallery>"
- 19:5319:53, November 23, 2020 diff hist −51 Nanofabrication/Equipment/MPCVD No edit summary current
- 19:4919:49, November 23, 2020 diff hist +19 N File:IMG 0064.JPG Lamda current
- 19:4719:47, November 23, 2020 diff hist −87 Nanofabrication/Equipment/MPCVD No edit summary
- 19:4619:46, November 23, 2020 diff hist +54 Nanofabrication/Equipment/Laserwriter No edit summary current
- 19:4319:43, November 23, 2020 diff hist +44 Nanofabrication/Equipment/Laserwriter →Laser Writer
- 19:4219:42, November 23, 2020 diff hist +42 Nanofabrication/Equipment →Lithographic Tools
- 19:4119:41, November 23, 2020 diff hist 0 N File:LaserWriter.jpg No edit summary current
- 19:3819:38, November 23, 2020 diff hist +1,058 Nanofabrication/Equipment/Laserwriter →Laser Writer
- 19:3519:35, November 23, 2020 diff hist +89 N Nanofabrication/Equipment/MLA Created page with "right|400px| The instrument is located in the clean room, room C118"
- 19:3519:35, November 23, 2020 diff hist −83 Nanofabrication/Equipment/Laserwriter →MLA150
- 19:3319:33, November 23, 2020 diff hist −10 Nanofabrication/Equipment →Lithographic Tools
- 19:1519:15, November 23, 2020 diff hist −7 Nanofabrication/Equipment/ PVD →FC2000 Electron Beam Evaporator current
- 19:1119:11, November 23, 2020 diff hist −37 Nanofabrication/Equipment/ PVD No edit summary
- 19:1019:10, November 23, 2020 diff hist +12 Nanofabrication/Equipment/ PVD No edit summary
- 19:0719:07, November 23, 2020 diff hist −230 Nanofabrication/Equipment/ PVD No edit summary
- 19:0319:03, November 23, 2020 diff hist −163 Nanofabrication/Equipment/ PVD No edit summary
- 19:0119:01, November 23, 2020 diff hist −20 Nanofabrication/Equipment/SmallSputter No edit summary current
- 19:0119:01, November 23, 2020 diff hist +64 N Nanofabrication/Equipment/SmallSputter Created page with "<gallery> File:Sputtercoater.jpg Example.jpg|Caption2 </gallery>"
- 19:0019:00, November 23, 2020 diff hist 0 N File:Sputtercoater.jpg No edit summary current
- 18:5718:57, November 23, 2020 diff hist +44 N File:IMG 0956.JPG ADT dicing saw mounting system current
- 18:5618:56, November 23, 2020 diff hist +47 N File:IMG 0963.JPG Keyence Laser Confocal Microscope current
- 18:5418:54, November 23, 2020 diff hist +24 N File:IMG 0971.JPG Evaporator current
- 18:5218:52, November 23, 2020 diff hist +28 N File:IMG 0955.JPG ADC Dicing Saw current
- 18:5018:50, November 23, 2020 diff hist +17 N File:IMG 0983.JPG FIB current
- 18:4518:45, November 23, 2020 diff hist +3 Nanofabrication/Equipment/Laserwriter →MLA
- 18:4518:45, November 23, 2020 diff hist −3 Nanofabrication/Equipment/Laserwriter No edit summary
- 18:4418:44, November 23, 2020 diff hist 0 N File:IMG 0981.JPG No edit summary current
- 18:3818:38, November 23, 2020 diff hist −1,067 Nanofabrication/Equipment/Laserwriter →Laser Writer
November 20, 2020
- 19:4919:49, November 20, 2020 diff hist +882 N Nanofabrication/Equipment/ICP-CVD Deposition System Created page with "== ICP - CVD Deposition System System== right|400px | The instrument is located in the clean room, ===Features=== Plasmalab System 100 is configured fo..."
- 19:4819:48, November 20, 2020 diff hist +7,905 N Nanofabrication/Equipment/Process Stations Created page with "=''RESIST PREPARATION AND DEVELOPMENT''= =='''Vertical Laminar Flow Exhausted Clean Bench (Polypropylene)'''== right|300px| *Located in C112 Lithograp..." current
- 19:4419:44, November 20, 2020 diff hist +115 N Nanofabrication/Equipment/Wafer Priming Oven Created page with "YES Priming oven for surface preparation using HMDS to improve resist adhesion. right|300px|" current
- 19:4319:43, November 20, 2020 diff hist +162 N Nanofabrication/Equipment/ Seeding Station for UNCD Deposition Created page with "== Seeding Station for UNCD Depostion == right|600px| ... == Features == * 2 Ultrasonic baths (1 large and 1 small) * Solvents for seeding" current
- 19:4119:41, November 20, 2020 diff hist +80 Nanofabrication/Equipment →Deposition
- 19:4019:40, November 20, 2020 diff hist +1,156 N Nanofabrication/Equipment/Critical Point Dryer Created page with "== Critical Point Dryer == The CPD 030 Critical Point Dryer is an efficient method of drying delicate samples without damaging its structure through surface tension that occu..."
- 19:0319:03, November 20, 2020 diff hist +1,024 N Nanofabrication/Equipment/ PVD Created page with "== AJA Sputter System (metals)== right|400px| The instrument is located in the clean room, File:Smallaja2.JPG|right|400px| The instrument is located..."
- 18:5818:58, November 20, 2020 diff hist +1,053 N Nanofabrication/Equipment/AJA Oxide Sputter System Created page with "== AJA Oxide Sputtering System== right|400px| The instrument is located in the clean room, ===Features=== The AJA oxide sputtering tool is a magnetro..."
- 18:5018:50, November 20, 2020 diff hist +1,364 N Nanofabrication/Equipment/MPCVD Created page with "right|400px| The instrument is located in the clean room, room C118 right|400px| The instrument is located in the clean room, room C118..."
- 18:4818:48, November 20, 2020 diff hist +949 N Nanofabrication/Equipment/REACTIVE ION ETCHERS Created page with "right|300px| * There are two systems CS-1701 RIE, one for fluorinated gases and one for chlorinated gases. The operational procedure is identical f..."
- 18:4718:47, November 20, 2020 diff hist +1,615 N Nanofabrication/Equipment/Oxford ICP and RIE etching system Created page with "== Oxford ICP and RIE Etcher (1 loadlock, 2 chambers)== right|300px| right|300px| ===Features=== :PlasmaLab System 100 (Oxford Instrum..."
- 18:4518:45, November 20, 2020 diff hist +1,725 N Nanofabrication/Equipment/FIB Created page with "==FEI Nova 600 NanoLab== right|400px| The instrument is located in the clean room, room C116 The FEI Nova 600 NanoLab is a dual-beam instrument th..."
- 18:4418:44, November 20, 2020 diff hist +756 N Nanofabrication/Equipment/Interferometric Created page with "==Interferometric Lithography system== right|400px| The instrument is located in the clean room, room C116 File:Laser2.JPG|right|400px| The instrument is..."
- 18:4218:42, November 20, 2020 diff hist +1,608 N Nanofabrication/Equipment/Laserwriter Created page with "==Laser Writer== right|400px| The instrument is located in the clean room, room C118 ===Features=== * The laser radiation is sent onto the substrat..."
- 18:4018:40, November 20, 2020 diff hist +1,614 N Nanofabrication/Equipment/MA6 Created page with " == MA6/BA6 Contact Aligner == == Features == * Front Side Alignment / Front to Back side Alignment * Exposure Optics: UV400 Lamp 350 Watts * UV lamp spectral Li..."
- 18:3818:38, November 20, 2020 diff hist +2,506 N Nanofabrication/Equipment Created page with "== Lithographic Tools == ; UV Mask Aligner (front side and front to back) ; Laser Writer ;Na..."
- 18:2118:21, November 20, 2020 diff hist +93 Nanofabrication/Photoresist No edit summary
- 18:1318:13, November 20, 2020 diff hist −62 Nanofabrication/Photoresist No edit summary
- 18:1218:12, November 20, 2020 diff hist +264 Nanofabrication/Photoresist No edit summary
- 01:4001:40, November 20, 2020 diff hist +115 Nanofabrication/Photoresist No edit summary
- 01:3701:37, November 20, 2020 diff hist +13 Nanofabrication/Photoresist No edit summary
- 01:3501:35, November 20, 2020 diff hist +25 Nanofabrication/Photoresist No edit summary
- 01:3001:30, November 20, 2020 diff hist +267 Nanofabrication/Photoresist No edit summary
- 01:2501:25, November 20, 2020 diff hist −46 Nanofabrication/Photoresist No edit summary
November 19, 2020
- 22:5622:56, November 19, 2020 diff hist +16 Nanofabrication/Photoresist No edit summary
- 22:5522:55, November 19, 2020 diff hist +116 Nanofabrication/Photoresist No edit summary
- 22:3922:39, November 19, 2020 diff hist +161 Nanofabrication/Photoresist No edit summary
- 22:3122:31, November 19, 2020 diff hist +11 N File:Photoresist 03302020.xlsx No edit summary current
- 22:2822:28, November 19, 2020 diff hist +310 Nanofabrication/Photoresist No edit summary
- 22:2522:25, November 19, 2020 diff hist +1,100 N Nanofabrication/Photoresist Created page with ":Microchem :[http://www.microchem.com/ Microchem] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and stripper..."
November 18, 2020
- 20:3120:31, November 18, 2020 diff hist +1 Nanofabrication No edit summary
- 20:2920:29, November 18, 2020 diff hist −144 Nanofabrication No edit summary
- 20:2720:27, November 18, 2020 diff hist −625 Nanofabrication No edit summary
- 18:5318:53, November 18, 2020 diff hist +1,100 N Nanofabrication Created page with ":Microchem :[http://www.microchem.com/ Microchem] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and stripper..."