User contributions for Csmiller
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June 3, 2021
- 19:3519:35, June 3, 2021 diff hist −168 Nanofabrication →Nanofabrication current
- 19:1619:16, June 3, 2021 diff hist −15 Nanofabrication Undo revision 6935 by Csmiller (talk) Tag: Undo
- 19:1419:14, June 3, 2021 diff hist +15 Nanofabrication →Nanofabrication
- 19:1119:11, June 3, 2021 diff hist +159 Patterning →Patterning current
- 19:0819:08, June 3, 2021 diff hist +100 Patterning →Patterning
- 19:0519:05, June 3, 2021 diff hist +22 Patterning →Patterning
- 19:0319:03, June 3, 2021 diff hist −3 Nanofabrication/Equipment/MA6 →Features current
- 19:0219:02, June 3, 2021 diff hist +1,116 N MA6 Created page with "== Features == * Front Side Alignment / Front to Back side Alignment * Exposure Optics: UV400 Lamp 350 Watts * UV lamp spectral Lines (nanometers): ** 436 g-line ** 405 h-li..." current
- 19:0119:01, June 3, 2021 diff hist −10 Nanofabrication/Equipment/MA6 →MA6/BA6 Contact Aligner
June 2, 2021
- 20:3420:34, June 2, 2021 diff hist +7 Nanofabrication →test new
- 20:3320:33, June 2, 2021 diff hist −76 Nanofabrication →CNM Cleanroom
- 20:3220:32, June 2, 2021 diff hist +2,461 N Photoresist Created page with " :Kayakuam :[https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists,..." current
- 20:2820:28, June 2, 2021 diff hist +17 Patterning →Patterning
- 20:2720:27, June 2, 2021 diff hist −17 Patterning →Patterning
- 20:2720:27, June 2, 2021 diff hist +17 Patterning →Patterning
- 20:2620:26, June 2, 2021 diff hist −70 Nanofabrication →CNM Cleanroom
- 20:2520:25, June 2, 2021 diff hist +16 Nanofabrication →test new
- 20:2420:24, June 2, 2021 diff hist −69 Nanofabrication →CNM Cleanroom
June 1, 2021
- 21:3321:33, June 1, 2021 diff hist +2 Nanofabrication →test new
- 21:3021:30, June 1, 2021 diff hist +117 N Hotplate Created page with "* Optical Hotplates ** Typical temperatures are 90C and 115C *EBL Hotplate ** Typical Temperatures are 150C and 180C" current
- 21:2821:28, June 1, 2021 diff hist +125 N Ovens Created page with "* YES Oven ** Adhesion promotion ** Vacuum Bake * Image Reversal ** Reversal positive photoresist to negative ** vacuum bake" current
- 21:1821:18, June 1, 2021 diff hist −69 Patterning →Patterning
- 21:1521:15, June 1, 2021 diff hist −27 Patterning →Patterning
- 21:1321:13, June 1, 2021 diff hist +216 Patterning →Patterning
- 21:0821:08, June 1, 2021 diff hist +41 Patterning →Patterning
- 21:0121:01, June 1, 2021 diff hist +47 N Patterning Created page with "== Patterning == <gallery> File:LaserWriter.jpg"
- 20:4520:45, June 1, 2021 diff hist +96 Nanofabrication No edit summary
- 20:3720:37, June 1, 2021 diff hist +23 Nanofabrication →CNM Cleanroom
January 29, 2021
- 00:4000:40, January 29, 2021 diff hist +21 Nanofabrication/Equipment/Wafer Dicing Saw →Dicing Saw current
January 8, 2021
- 21:4721:47, January 8, 2021 diff hist +403 Nanofabrication/Equipment/Wafer Dicing Saw →Dicing Saw
December 7, 2020
- 16:2216:22, December 7, 2020 diff hist +25 Nanofabrication/Equipment/Filmetrics No edit summary current
- 16:1216:12, December 7, 2020 diff hist +57 Nanofabrication/Equipment/Filmetrics No edit summary
- 15:3615:36, December 7, 2020 diff hist 0 N File:Filmetrics.jpg No edit summary current
- 15:1115:11, December 7, 2020 diff hist −5 Nanofabrication/Equipment/Filmetrics →User Proposal Feasibility
- 15:1015:10, December 7, 2020 diff hist +191 N Nanofabrication/Equipment/Filmetrics Created page with "==Features== ===User Proposal Feasibility=== When requesting the use of this instrument, please provide the following information in your user proposal: * Sample materials..."
- 15:0815:08, December 7, 2020 diff hist +63 Nanofabrication/Equipment →Metrology current
November 25, 2020
- 17:2817:28, November 25, 2020 diff hist +1 Nanofabrication/Equipment Undo revision 6737 by Csmiller (talk) Tag: Undo
- 17:2717:27, November 25, 2020 diff hist −1 Nanofabrication/Equipment →Plasma and Reactive Ion Etching
- 17:2617:26, November 25, 2020 diff hist +78 Nanofabrication/Equipment →Plasma and Reactive Ion Etching
- 17:2317:23, November 25, 2020 diff hist +315 Nanofabrication/Equipment/Oxford ICP etching system No edit summary current
- 17:2117:21, November 25, 2020 diff hist +33 Nanofabrication/Equipment/Oxford ICP etching system No edit summary
- 17:1817:18, November 25, 2020 diff hist −4 Nanofabrication/Equipment/Oxford ICP etching system →Features
- 17:1717:17, November 25, 2020 diff hist +61 Nanofabrication/Equipment/Oxford ICP etching system No edit summary
- 17:1517:15, November 25, 2020 diff hist +25 Nanofabrication/Equipment/REACTIVE ION ETCHERS No edit summary current
- 17:1417:14, November 25, 2020 diff hist +1,259 N Nanofabrication/Equipment/Oxford ICP etching system Created page with "===Features=== :PlasmaLab System 100 (Oxford Instruments) located in C122. The system comprises two process stations (Process Station 1 (ICP 180) dedicated to chlorine-based e..."
- 17:1117:11, November 25, 2020 diff hist −16 Nanofabrication/Equipment →Plasma and Reactive Ion Etching
- 17:0717:07, November 25, 2020 diff hist −30 Nanofabrication/Equipment/Oxford ICP and RIE etching system No edit summary current
- 17:0517:05, November 25, 2020 diff hist 0 N File:ICPRIE.JPG No edit summary current
- 16:5116:51, November 25, 2020 diff hist −18 Nanofabrication/Equipment/REACTIVE ION ETCHERS No edit summary
- 16:5016:50, November 25, 2020 diff hist 0 N File:March1.jpg No edit summary current
