Nanofabrication/Equipment: Difference between revisions
Jump to navigation
Jump to search
| (One intermediate revision by the same user not shown) | |||
| Line 23: | Line 23: | ||
;[[Nanofabrication/Equipment/Oxford ICP Etching System | Oxford 6 Inch ICP]] | ;[[Nanofabrication/Equipment/Oxford ICP Etching System | Oxford 6 Inch ICP]] | ||
;[[Nanofabrication/Equipment/ | ;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]] | ||
== Wet Processing == | == Wet Processing == | ||
| Line 57: | Line 57: | ||
;[[Nanofabrication/Equipment/Surface Profilometer | SURFACE PROFILOMETERS]] | ;[[Nanofabrication/Equipment/Surface Profilometer | SURFACE PROFILOMETERS]] | ||
;[[Nanofabrication/Equipment/Filmetrics | Filmetrics F40-UV]] | |||
;[[Nanofabrication/Equipment/Optical Microscope | OPTICAL MICROSCOPE]] | ;[[Nanofabrication/Equipment/Optical Microscope | OPTICAL MICROSCOPE]] | ||
Latest revision as of 15:08, December 7, 2020
Lithographic Tools
Plasma and Reactive Ion Etching
Wet Processing
Deposition
Nanocarbon Synthesis Facilities
Metrology
Misc Tools