Nanofabrication/Equipment: Difference between revisions

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== Plasma and Reactive Ion Etching ==  
== Plasma and Reactive Ion Etching ==  


;[[Nanofabrication/Equipment/Oxford ICP and RIE etching system | Oxford ICP and RIE etching system (2 chambers - 1 loadlock)]]
;[[Nanofabrication/Equipment/Oxford ICP etching system | Oxford ICP etching system (2 chambers - 1 loadlock)]]
 
;[[Nanofabrication/Equipment/Oxford ICP Etching System | Oxford 6 Inch ICP]]


;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]]
;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]]
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;[[Nanofabrication/Equipment/AJA Oxide Sputter System |  AJA Oxide Sputter System]]
;[[Nanofabrication/Equipment/AJA Oxide Sputter System |  AJA Oxide Sputter System]]


;[[Nanofabrication/Equipment/ METAL Sputter | AJA Sputter System (metals)]]
;[[Nanofabrication/Equipment/ Metal Sputter System| AJA Sputter System (metals)]]


;[[Nanofabrication/Equipment/ PVD | FC2000 Ferrotec Ebeam Evaporator(metals)]]
;[[Nanofabrication/Equipment/ PVD | FC2000 Ferrotec Ebeam Evaporator(metals)]]
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;[[Nanofabrication/Equipment/Surface Profilometer | SURFACE PROFILOMETERS]]
;[[Nanofabrication/Equipment/Surface Profilometer | SURFACE PROFILOMETERS]]
;[[Nanofabrication/Equipment/Filmetrics | Filmetrics F40-UV]]
   
   
;[[Nanofabrication/Equipment/Optical Microscope | OPTICAL MICROSCOPE]]
;[[Nanofabrication/Equipment/Optical Microscope | OPTICAL MICROSCOPE]]

Latest revision as of 15:08, December 7, 2020