Nanofabrication/Equipment

From CNM Wiki
< Nanofabrication
Revision as of 15:08, December 7, 2020 by Csmiller (talk | contribs) (→‎Metrology)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

Lithographic Tools

  • LaserWriter.jpg
UV Mask Aligner (front side and front to back)
Laser Writer
MLA
Interferometric Lithography System
100KV Electron Beam Lithography System (JEOL 9100 FS)
Raith 30KV Electron Beam Lithography System
Focused Ion Beam System

Plasma and Reactive Ion Etching

Oxford ICP etching system (2 chambers - 1 loadlock)
Oxford 6 Inch ICP
March RIE etchers

Wet Processing

WAFER PRIMING OVEN
LAMINAR FLOW PROCESS STATIONS

Deposition

Small Coater
AJA Oxide Sputter System
AJA Sputter System (metals)
FC2000 Ferrotec Ebeam Evaporator(metals)
ICP - CVD Deposition System

Nanocarbon Synthesis Facilities

Lamda Microwave Plasma CVD system (nanocrystalline diamond deposition)
Thermal/PECVD System for Synthesis of CNT and Graphene
Seeding Station for UNCD Deposition

Metrology

SPECTROSCOPIC ELLIPSOMETER
SCANNING PROBE MICROSCOPE
SURFACE PROFILOMETERS
Filmetrics F40-UV
OPTICAL MICROSCOPE
RESISTIVITY MEASUREMENT SYSTEM
SCANNING VIBRATING ELECTRODE SYSTEM
VOLTAMMETRY SYSTEM

Misc Tools

ADT 7200 Dicing Saw
Critical Point Dryer


Electrical Test and Characterization

Retrieved from "https://wiki.anl.gov/wiki_cnm/index.php?title=Nanofabrication/Equipment&oldid=6744"