User contributions for Csmiller

November 23, 2020

• 19:1119:11, November 23, 2020 diff hist −37‎ Nanofabrication/Equipment/ PVD ‎No edit summary
• 19:1019:10, November 23, 2020 diff hist +12‎ Nanofabrication/Equipment/ PVD ‎No edit summary
• 19:0719:07, November 23, 2020 diff hist −230‎ Nanofabrication/Equipment/ PVD ‎No edit summary
• 19:0319:03, November 23, 2020 diff hist −163‎ Nanofabrication/Equipment/ PVD ‎No edit summary
• 19:0119:01, November 23, 2020 diff hist −20‎ Nanofabrication/Equipment/SmallSputter ‎No edit summary current
• 19:0119:01, November 23, 2020 diff hist +64‎ N Nanofabrication/Equipment/SmallSputter ‎ Created page with "<gallery> File:Sputtercoater.jpg Example.jpg|Caption2 </gallery>"
• 19:0019:00, November 23, 2020 diff hist 0‎ N File:Sputtercoater.jpg ‎No edit summary current
• 18:5718:57, November 23, 2020 diff hist +44‎ N File:IMG 0956.JPG ‎ ADT dicing saw mounting system current
• 18:5618:56, November 23, 2020 diff hist +47‎ N File:IMG 0963.JPG ‎ Keyence Laser Confocal Microscope current
• 18:5418:54, November 23, 2020 diff hist +24‎ N File:IMG 0971.JPG ‎ Evaporator current
• 18:5218:52, November 23, 2020 diff hist +28‎ N File:IMG 0955.JPG ‎ ADC Dicing Saw current
• 18:5018:50, November 23, 2020 diff hist +17‎ N File:IMG 0983.JPG ‎ FIB current
• 18:4518:45, November 23, 2020 diff hist +3‎ Nanofabrication/Equipment/Laserwriter ‎ →‎MLA
• 18:4518:45, November 23, 2020 diff hist −3‎ Nanofabrication/Equipment/Laserwriter ‎No edit summary
• 18:4418:44, November 23, 2020 diff hist 0‎ N File:IMG 0981.JPG ‎No edit summary current
• 18:3818:38, November 23, 2020 diff hist −1,067‎ Nanofabrication/Equipment/Laserwriter ‎ →‎Laser Writer

November 20, 2020

• 19:4919:49, November 20, 2020 diff hist +882‎ N Nanofabrication/Equipment/ICP-CVD Deposition System ‎ Created page with "== ICP - CVD Deposition System System== right|400px | The instrument is located in the clean room, ===Features=== Plasmalab System 100 is configured fo..."
• 19:4819:48, November 20, 2020 diff hist +7,905‎ N Nanofabrication/Equipment/Process Stations ‎ Created page with "=''RESIST PREPARATION AND DEVELOPMENT''= =='''Vertical Laminar Flow Exhausted Clean Bench (Polypropylene)'''== right|300px| *Located in C112 Lithograp..." current
• 19:4419:44, November 20, 2020 diff hist +115‎ N Nanofabrication/Equipment/Wafer Priming Oven ‎ Created page with "YES Priming oven for surface preparation using HMDS to improve resist adhesion. right|300px|" current
• 19:4319:43, November 20, 2020 diff hist +162‎ N Nanofabrication/Equipment/ Seeding Station for UNCD Deposition ‎ Created page with "== Seeding Station for UNCD Depostion == right|600px| ... == Features == * 2 Ultrasonic baths (1 large and 1 small) * Solvents for seeding" current
• 19:4119:41, November 20, 2020 diff hist +80‎ Nanofabrication/Equipment ‎ →‎Deposition
• 19:4019:40, November 20, 2020 diff hist +1,156‎ N Nanofabrication/Equipment/Critical Point Dryer ‎ Created page with "== Critical Point Dryer == The CPD 030 Critical Point Dryer is an efficient method of drying delicate samples without damaging its structure through surface tension that occu..."
• 19:0319:03, November 20, 2020 diff hist +1,024‎ N Nanofabrication/Equipment/ PVD ‎ Created page with "== AJA Sputter System (metals)== right|400px| The instrument is located in the clean room, File:Smallaja2.JPG|right|400px| The instrument is located..."
• 18:5818:58, November 20, 2020 diff hist +1,053‎ N Nanofabrication/Equipment/AJA Oxide Sputter System ‎ Created page with "== AJA Oxide Sputtering System== right|400px| The instrument is located in the clean room, ===Features=== The AJA oxide sputtering tool is a magnetro..."
• 18:5018:50, November 20, 2020 diff hist +1,364‎ N Nanofabrication/Equipment/MPCVD ‎ Created page with "right|400px| The instrument is located in the clean room, room C118 right|400px| The instrument is located in the clean room, room C118..."
• 18:4818:48, November 20, 2020 diff hist +949‎ N Nanofabrication/Equipment/REACTIVE ION ETCHERS ‎ Created page with "right|300px| * There are two systems CS-1701 RIE, one for fluorinated gases and one for chlorinated gases. The operational procedure is identical f..."
• 18:4718:47, November 20, 2020 diff hist +1,615‎ N Nanofabrication/Equipment/Oxford ICP and RIE etching system ‎ Created page with "== Oxford ICP and RIE Etcher (1 loadlock, 2 chambers)== right|300px| right|300px| ===Features=== :PlasmaLab System 100 (Oxford Instrum..."
• 18:4518:45, November 20, 2020 diff hist +1,725‎ N Nanofabrication/Equipment/FIB ‎ Created page with "==FEI Nova 600 NanoLab== right|400px| The instrument is located in the clean room, room C116 The FEI Nova 600 NanoLab is a dual-beam instrument th..."
• 18:4418:44, November 20, 2020 diff hist +756‎ N Nanofabrication/Equipment/Interferometric ‎ Created page with "==Interferometric Lithography system== right|400px| The instrument is located in the clean room, room C116 File:Laser2.JPG|right|400px| The instrument is..."
• 18:4218:42, November 20, 2020 diff hist +1,608‎ N Nanofabrication/Equipment/Laserwriter ‎ Created page with "==Laser Writer== right|400px| The instrument is located in the clean room, room C118 ===Features=== * The laser radiation is sent onto the substrat..."
• 18:4018:40, November 20, 2020 diff hist +1,614‎ N Nanofabrication/Equipment/MA6 ‎ Created page with " == MA6/BA6 Contact Aligner == == Features == * Front Side Alignment / Front to Back side Alignment * Exposure Optics: UV400 Lamp 350 Watts * UV lamp spectral Li..."
• 18:3818:38, November 20, 2020 diff hist +2,506‎ N Nanofabrication/Equipment ‎ Created page with "== Lithographic Tools == ; UV Mask Aligner (front side and front to back) ; Laser Writer ;Na..."
• 18:2118:21, November 20, 2020 diff hist +93‎ Nanofabrication/Photoresist ‎No edit summary
• 18:1318:13, November 20, 2020 diff hist −62‎ Nanofabrication/Photoresist ‎No edit summary
• 18:1218:12, November 20, 2020 diff hist +264‎ Nanofabrication/Photoresist ‎No edit summary
• 01:4001:40, November 20, 2020 diff hist +115‎ Nanofabrication/Photoresist ‎No edit summary
• 01:3701:37, November 20, 2020 diff hist +13‎ Nanofabrication/Photoresist ‎No edit summary
• 01:3501:35, November 20, 2020 diff hist +25‎ Nanofabrication/Photoresist ‎No edit summary
• 01:3001:30, November 20, 2020 diff hist +267‎ Nanofabrication/Photoresist ‎No edit summary
• 01:2501:25, November 20, 2020 diff hist −46‎ Nanofabrication/Photoresist ‎No edit summary

November 19, 2020

• 22:5622:56, November 19, 2020 diff hist +16‎ Nanofabrication/Photoresist ‎No edit summary
• 22:5522:55, November 19, 2020 diff hist +116‎ Nanofabrication/Photoresist ‎No edit summary
• 22:3922:39, November 19, 2020 diff hist +161‎ Nanofabrication/Photoresist ‎No edit summary
• 22:3122:31, November 19, 2020 diff hist +11‎ N File:Photoresist 03302020.xlsx ‎No edit summary current
• 22:2822:28, November 19, 2020 diff hist +310‎ Nanofabrication/Photoresist ‎No edit summary
• 22:2522:25, November 19, 2020 diff hist +1,100‎ N Nanofabrication/Photoresist ‎ Created page with ":Microchem :[http://www.microchem.com/ Microchem] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and stripper..."

November 18, 2020

• 20:3120:31, November 18, 2020 diff hist +1‎ Nanofabrication ‎No edit summary
• 20:2920:29, November 18, 2020 diff hist −144‎ Nanofabrication ‎No edit summary
• 20:2720:27, November 18, 2020 diff hist −625‎ Nanofabrication ‎No edit summary
• 18:5318:53, November 18, 2020 diff hist +1,100‎ N Nanofabrication ‎ Created page with ":Microchem :[http://www.microchem.com/ Microchem] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and stripper..."