Nanofabrication/Equipment: Difference between revisions
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== Plasma and Reactive Ion Etching == | == Plasma and Reactive Ion Etching == | ||
;[[Nanofabrication/Equipment/Oxford ICP | ;[[Nanofabrication/Equipment/Oxford ICP etching system | Oxford ICP etching system (2 chambers - 1 loadlock)]] | ||
;[[Nanofabrication/Equipment/Oxford ICP Etching System | Oxford 6 Inch ICP]] | |||
;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]] | ;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]] | ||
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;[[Nanofabrication/Equipment/AJA Oxide Sputter System | AJA Oxide Sputter System]] | ;[[Nanofabrication/Equipment/AJA Oxide Sputter System | AJA Oxide Sputter System]] | ||
;[[Nanofabrication/Equipment/ | ;[[Nanofabrication/Equipment/ Metal Sputter System| AJA Sputter System (metals)]] | ||
;[[Nanofabrication/Equipment/ PVD | FC2000 Ferrotec Ebeam Evaporator(metals)]] | ;[[Nanofabrication/Equipment/ PVD | FC2000 Ferrotec Ebeam Evaporator(metals)]] | ||
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;[[Nanofabrication/Equipment/Surface Profilometer | SURFACE PROFILOMETERS]] | ;[[Nanofabrication/Equipment/Surface Profilometer | SURFACE PROFILOMETERS]] | ||
;[[Nanofabrication/Equipment/Filmetrics | Filmetrics F40-UV]] | |||
;[[Nanofabrication/Equipment/Optical Microscope | OPTICAL MICROSCOPE]] | ;[[Nanofabrication/Equipment/Optical Microscope | OPTICAL MICROSCOPE]] | ||
Latest revision as of 15:08, December 7, 2020
Lithographic Tools
Plasma and Reactive Ion Etching
Wet Processing
Deposition
Nanocarbon Synthesis Facilities
Metrology
Misc Tools