Nanofabrication/Equipment: Difference between revisions
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== Plasma and Reactive Ion Etching == | == Plasma and Reactive Ion Etching == | ||
;[[Nanofabrication/Equipment/Oxford ICP | ;[[Nanofabrication/Equipment/Oxford ICP etching system | Oxford ICP etching system (2 chambers - 1 loadlock)]] | ||
;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]] | ;[[Nanofabrication/Equipment/REACTIVE ION ETCHERS | March RIE etchers]] | ||
Revision as of 17:11, November 25, 2020
Lithographic Tools
Plasma and Reactive Ion Etching
Wet Processing
Deposition
Nanocarbon Synthesis Facilities
Metrology
Misc Tools