Nanofabrication/Equipment: Difference between revisions
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;[[Nanofabrication/Equipment/Laserwriter | Laser Writer]] | ;[[Nanofabrication/Equipment/Laserwriter | Laser Writer]] | ||
;[[Nanofabrication/Equipment/ | ;[[Nanofabrication/Equipment/MLA | MLA]] | ||
;[[Nanofabrication/Equipment/Interferometric | Interferometric Lithography System]] | ;[[Nanofabrication/Equipment/Interferometric | Interferometric Lithography System]] | ||
| Line 13: | Line 13: | ||
;[[Nanofabrication/Equipment/FIB | Focused Ion Beam System]] | ;[[Nanofabrication/Equipment/FIB | Focused Ion Beam System]] | ||
== Plasma and Reactive Ion Etching == | == Plasma and Reactive Ion Etching == | ||
Revision as of 19:33, November 23, 2020
Lithographic Tools
Plasma and Reactive Ion Etching
Wet Processing
Deposition
Nanocarbon Synthesis Facilities
Metrology
Misc Tools