Nanofabrication/Equipment/Interferometric: Difference between revisions
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==Interferometric Lithography system== | ==Interferometric Lithography system== | ||
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Latest revision as of 21:10, November 23, 2020
Interferometric Lithography system
Features
The instrument is located in the CNM clean room.
User Proposal Feasibility
When requesting the use of this instrument, please provide the following information in your user proposal:
- Sample materials, shapes, and sizes
- Information about the intended patterns (shapes, sizes, distances, area coverage)
- Important pattern quality requirements (if any)
- Number of samples to process or number of times of instrument usage
Questions? Please contact the instrument custodian before submitting your proposal.