Nanofabrication/Equipment/ PVD: Difference between revisions

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== AJA Sputter System (metals)==
== FC2000 Electron Beam Evaporator
<gallery>
File:IMG 0971.JPG


The FC2000 (Temescal) Evaporator has a 6 pocket gun.
Extension Collar for enhanced throw distance.




===Features===
===Features===
The AJA general sputtering tool is an on-axis magnetron sputtering tool. The tool has 3, 2” diameter targets with multiple degrees of freedom (tilt, z-axis position), heating capabilities up to 800 °C across a 150 mm wafer, 1-RF and 3-DC sources, a load lock system, and computer automated control. This tool provides fast deposition rates for both metals (DC sputtering) and oxides (RF sputtering) because of the 2” target sizes.
Metals Sources always available: Ti, Cr, Au, Pt, Al  - direct in the box
===User Proposal Feasibility===
Optional : Silver, Pd (in crucible)


When requesting the use of this instrument, please provide the following information in your user proposal:
When requesting the use of this instrument, please provide the following information in your user proposal:

Revision as of 19:07, November 23, 2020

== FC2000 Electron Beam Evaporator <gallery> File:IMG 0971.JPG

The FC2000 (Temescal) Evaporator has a 6 pocket gun. Extension Collar for enhanced throw distance.


Features

Metals Sources always available: Ti, Cr, Au, Pt, Al - direct in the box Optional : Silver, Pd (in crucible)

When requesting the use of this instrument, please provide the following information in your user proposal:

  • Sample materials, shapes, and sizes
  • Temperature compatibility of samples.
  • Number of samples to process or number of times of instrument usage

Questions? Please contact the instrument custodian before submitting your proposal.

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