Nanofabrication/Equipment/ PVD: Difference between revisions
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== AJA Sputter System (metals)== | == AJA Sputter System (metals)== | ||
Revision as of 19:03, November 23, 2020
AJA Sputter System (metals)
Features
The AJA general sputtering tool is an on-axis magnetron sputtering tool. The tool has 3, 2” diameter targets with multiple degrees of freedom (tilt, z-axis position), heating capabilities up to 800 °C across a 150 mm wafer, 1-RF and 3-DC sources, a load lock system, and computer automated control. This tool provides fast deposition rates for both metals (DC sputtering) and oxides (RF sputtering) because of the 2” target sizes.
User Proposal Feasibility
When requesting the use of this instrument, please provide the following information in your user proposal:
- Sample materials, shapes, and sizes
- Temperature compatibility of samples.
- Number of samples to process or number of times of instrument usage
Questions? Please contact the instrument custodian before submitting your proposal.