Nanofabrication/Equipment/ PVD: Difference between revisions

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== AJA Sputter System (metals)==
== FC2000 Electron Beam Evaporator==
 
[[File:IMG 0971.JPG|right|400px| The instrument is located in the clean room, room C118]]






===Features===
===Features===
The AJA general sputtering tool is an on-axis magnetron sputtering tool. The tool has 3, 2” diameter targets with multiple degrees of freedom (tilt, z-axis position), heating capabilities up to 800 °C across a 150 mm wafer, 1-RF and 3-DC sources, a load lock system, and computer automated control. This tool provides fast deposition rates for both metals (DC sputtering) and oxides (RF sputtering) because of the 2” target sizes.
Metals Sources always available: Ti, Cr, Au, Pt, Al  - direct in pocket;
===User Proposal Feasibility===
Optional : Silver, Pd (in crucible)


When requesting the use of this instrument, please provide the following information in your user proposal:
When requesting the use of this instrument, please provide the following information in your user proposal:

Latest revision as of 19:15, November 23, 2020

FC2000 Electron Beam Evaporator

The instrument is located in the clean room, room C118


Features

Metals Sources always available: Ti, Cr, Au, Pt, Al - direct in pocket; Optional : Silver, Pd (in crucible)

When requesting the use of this instrument, please provide the following information in your user proposal:

  • Sample materials, shapes, and sizes
  • Temperature compatibility of samples.
  • Number of samples to process or number of times of instrument usage

Questions? Please contact the instrument custodian before submitting your proposal.

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