Nanofabrication/Equipment/Process Stations

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RESIST PREPARATION AND DEVELOPMENT

Vertical Laminar Flow Exhausted Clean Bench (Polypropylene)

  • Located in C112 Lithography Chemistry
  • Applications: resist development with basic solutions and anisotropic etching of Si with KOH solution
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to bases)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off gun with inline filter
  • DIW hand sprayer
  • Timers
  • One DIW gooseneck and sink
  • One DIW cascade for 6” wafer cassette and resistivity monitor, with filling switch and drain switch
  • KOH bath (hot plate, secondary container, beaker, condensor)

Vertical Laminar Flow Exhausted Clean Bench (Polypropylene)

  • Located in C112 Lithography Chemistry
  • Applications: resist development with basic solutions
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to bases)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off gun with inline filter
  • DIW hand sprayer
  • Timers
  • One DIW gooseneck and sink
  • One DIW cascade for 6” wafer cassette and resistivity monitor, with filling switch and drain switch


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C112 Lithography Chemistry
  • Applications: polymers and non-standard resists coating and baking
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off gun with inline filter
  • Timers
  • Laurell spinners
  • Hot plates
  • Lower vented storage compartment with sliding doors to store optical resist


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C112 Lithography Chemistry
  • Applications: e-beam resist development, lift-off process
  • 96” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • DIW hand sprayers
  • One DIW gooseneck and sink
  • Timers
  • Hot plates
  • Ultrasonic bath
  • Cold development set-up


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C115 Resist Preparation
  • Applications: e-beam resist annealing, resist dilution
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • Timers
  • Hot plates, temperature controller


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C115 Resist Preparation
  • Applications: e-beam resist coating and baking
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • Timers
  • Laurell spinners
  • Hot plates
  • Lower vented storage compartment with sliding doors to store e-beam resist.


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C115 Resist Preparation
  • Applications: optical resist coating and baking
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • Timers
  • Laurell spinners
  • Hot plates
  • Lower vented storage compartment with sliding doors to store optical resist.


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C115 Resist Preparation
  • Applications: optical resist baking
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • Timers
  • Hot plates with temperature controller
  • YES Priming oven for surface preparation using HMDS to improve resist adhesion



WET CHEMISTRY AND ELECTROCHEMISTRY

Polypropylene Process Station

  • Located in C114
  • Applications: wet etching with basic solutions
  • 72” Open Wet Bench
  • Clear eye front shield with hinged front access panels (resistant to basic solution)
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • DIW hand sprayers
  • One DIW gooseneck and sink
  • DIW dump and over flow rinse tank with programmable mode
  • Timers
  • Lower tank compartment with controlled valves to dump bases or hazardous rinse water.
  • Optional: hot plates.


Polypropylene Process Station

  • Located in C114
  • Applications: wet etching with acidic solutions
  • 72” Open Wet Bench
  • Clear eye front shield with hinged front access panels (resistant to acidic solution)
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • DIW hand sprayers
  • One DIW gooseneck and sink
  • DIW dump and over flow rinse tank with programmable mode
  • Timers
  • Lower tank compartment with controlled valves to dump acids or hazardous rinse water.
  • Hot plates.


Polypropylene Process Station

  • Located in C114
  • Applications: electroplating
  • 72” Open Wet Bench
  • Clear eye front shield with hinged front access panels (resistant to acidic solution)
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • DIW hand sprayers
  • One DIW gooseneck and sink
  • Timers
  • Electroplating bathes: copper, gold, nickel, platinum, chromium (hot plates, power supplies, beakers, filtration pumps)


Polypropylene Process Station

  • Located in C114
  • Applications: electroplating, anodic bonding
  • 72” Open Wet Bench
  • Clear eye front shield with hinged front access panels (resistant to acidic and basic solution)
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • Timers
  • Anodic bonding set-up: hot plates, power supplies, stereo microscope.



Polypropylene Process Station

  • Located in C114
  • Applications: electrochemistry analysis (scanning vibrating electrode- investigation of localized surface phenomena-such as pitting corrosion, defects in coating, inhibitor functionality, microbial influenced corrosion and inter-granular corrosion).
  • 72” Open Wet Bench
  • Clear eye front shield with hinged front access panels (resistant to basic and acidic solution)
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • DIW hand sprayers
  • One DIW gooseneck and sink
  • Timers
  • Scanning Vibrating Electrode M370


Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)

  • Located in C11? UNCD seeding
  • Applications: UNCD seeding
  • 72” Open Wet Bench
  • Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
  • Light switch and fan switch
  • Electrical out-lets
  • Vacuum, compressed air and nitrogen ports
  • N2 blow off guns with inline filter
  • Timers
  • Ultrasonic bathes
  • Lower vented storage compartment with doors to store solvents.