Nanofabrication/Equipment/Laserwriter: Difference between revisions

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==MLA==
[[File:LaserWriter.jpg|right|400px| The instrument is located in the clean room, room C118]]
==Laser Writer==
 


[[File:LaserWriter.JPG|right|400px| The instrument is located in the clean room, room C118]]




===Features===
===Features===
.
* The laser radiation is sent onto the substrate through a final focusing lens placed in the upper part of the work chamber.
* The operator can choose among the following stop positions:
  - Low resolution lens (NA limited to 0.12). This position is usually used for large field substrate inspection and not for writing, as the low NA value lens corresponds to a minimum achievable linewidth around 8 μm, which is too large for most applications.
  - Medium resolution lens, with NA = 0.25. Besides surface inspection, this position can be used for writing. This medium resolution lens allows aminimum linewidth of about 4 μm.
  - High resolution lens, with NA = 0.4. Besides surface inspection, this position is well suited for writing, because it allows a linewidth around 2 μm.
  - Max resolution lens (NA = 0.65). In this position writing occurs with the maximum optical resolution (1 μm linewidth or better, limited by proximity effects in the photoresist).
  - Spare position, for future optical accessories.
  - Any gdsi or cif layout can be used.





Latest revision as of 19:46, November 23, 2020

The instrument is located in the clean room, room C118

Laser Writer

Features

  • The laser radiation is sent onto the substrate through a final focusing lens placed in the upper part of the work chamber.
  • The operator can choose among the following stop positions:
 - Low resolution lens (NA limited to 0.12). This position is usually used for large field substrate inspection and not for writing, as the low NA value lens corresponds to a minimum achievable linewidth around 8 μm, which is too large for most applications.
 - Medium resolution lens, with NA = 0.25. Besides surface inspection, this position can be used for writing. This medium resolution lens allows aminimum linewidth of about 4 μm.
 - High resolution lens, with NA = 0.4. Besides surface inspection, this position is well suited for writing, because it allows a linewidth around 2 μm.
 - Max resolution lens (NA = 0.65). In this position writing occurs with the maximum optical resolution (1 μm linewidth or better, limited by proximity effects in the photoresist).
 - Spare position, for future optical accessories.
 - Any gdsi or cif layout can be used.


User Proposal Feasibility

When requesting the use of this instrument, please provide the following information in your user proposal:

  • Sample materials, shapes, and sizes
  • Information about the intended patterns (shapes, sizes, distances, area coverage)
  • Number of samples to process or number of times of instrument usage

Questions? Please contact the instrument custodian before submitting your proposal.