Nanofabrication/Equipment/LVEBL

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Raith 30 KV Ebeam Lithography System

The Raith is a 30KV electron beam lithography tool.

IMG 0996.JPG

Features

  • 30 kV electron beam column


The instrument is located in the CNM clean room

User Proposal Feasibility

When requesting the use of this instrument, please provide the following information in your user proposal:

  • Sample materials, shapes, and sizes
  • Information about the intended patterns (shapes, sizes, distances, area coverage)
  • Important pattern quality requirements (if any)
  • Number of samples to process or number of times of instrument usage