Nanofabrication/Equipment/Process Stations
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RESIST PREPARATION AND DEVELOPMENT
Vertical Laminar Flow Exhausted Clean Bench (Polypropylene)
- Located in C112 Lithography Chemistry
- Applications: resist development with basic solutions and anisotropic etching of Si with KOH solution
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to bases)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off gun with inline filter
- DIW hand sprayer
- Timers
- One DIW gooseneck and sink
- One DIW cascade for 6” wafer cassette and resistivity monitor, with filling switch and drain switch
- KOH bath (hot plate, secondary container, beaker, condensor)
Vertical Laminar Flow Exhausted Clean Bench (Polypropylene)
- Located in C112 Lithography Chemistry
- Applications: resist development with basic solutions
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to bases)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off gun with inline filter
- DIW hand sprayer
- Timers
- One DIW gooseneck and sink
- One DIW cascade for 6” wafer cassette and resistivity monitor, with filling switch and drain switch
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C112 Lithography Chemistry
- Applications: polymers and non-standard resists coating and baking
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off gun with inline filter
- Timers
- Laurell spinners
- Hot plates
- Lower vented storage compartment with sliding doors to store optical resist
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C112 Lithography Chemistry
- Applications: e-beam resist development, lift-off process
- 96” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- DIW hand sprayers
- One DIW gooseneck and sink
- Timers
- Hot plates
- Ultrasonic bath
- Cold development set-up
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C115 Resist Preparation
- Applications: e-beam resist annealing, resist dilution
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- Timers
- Hot plates, temperature controller
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C115 Resist Preparation
- Applications: e-beam resist coating and baking
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- Timers
- Laurell spinners
- Hot plates
- Lower vented storage compartment with sliding doors to store e-beam resist.
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C115 Resist Preparation
- Applications: optical resist coating and baking
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- Timers
- Laurell spinners
- Hot plates
- Lower vented storage compartment with sliding doors to store optical resist.
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C115 Resist Preparation
- Applications: optical resist baking
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- Timers
- Hot plates with temperature controller
- YES Priming oven for surface preparation using HMDS to improve resist adhesion
WET CHEMISTRY AND ELECTROCHEMISTRY
Polypropylene Process Station
- Located in C114
- Applications: wet etching with basic solutions
- 72” Open Wet Bench
- Clear eye front shield with hinged front access panels (resistant to basic solution)
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- DIW hand sprayers
- One DIW gooseneck and sink
- DIW dump and over flow rinse tank with programmable mode
- Timers
- Lower tank compartment with controlled valves to dump bases or hazardous rinse water.
- Optional: hot plates.
Polypropylene Process Station
- Located in C114
- Applications: wet etching with acidic solutions
- 72” Open Wet Bench
- Clear eye front shield with hinged front access panels (resistant to acidic solution)
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- DIW hand sprayers
- One DIW gooseneck and sink
- DIW dump and over flow rinse tank with programmable mode
- Timers
- Lower tank compartment with controlled valves to dump acids or hazardous rinse water.
- Hot plates.
Polypropylene Process Station
- Located in C114
- Applications: electroplating
- 72” Open Wet Bench
- Clear eye front shield with hinged front access panels (resistant to acidic solution)
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- DIW hand sprayers
- One DIW gooseneck and sink
- Timers
- Electroplating bathes: copper, gold, nickel, platinum, chromium (hot plates, power supplies, beakers, filtration pumps)
Polypropylene Process Station
- Located in C114
- Applications: electroplating, anodic bonding
- 72” Open Wet Bench
- Clear eye front shield with hinged front access panels (resistant to acidic and basic solution)
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- Timers
- Anodic bonding set-up: hot plates, power supplies, stereo microscope.
Polypropylene Process Station
- Located in C114
- Applications: electrochemistry analysis (scanning vibrating electrode- investigation of localized surface phenomena-such as pitting corrosion, defects in coating, inhibitor functionality, microbial influenced corrosion and inter-granular corrosion).
- 72” Open Wet Bench
- Clear eye front shield with hinged front access panels (resistant to basic and acidic solution)
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- DIW hand sprayers
- One DIW gooseneck and sink
- Timers
- Scanning Vibrating Electrode M370
Vertical Laminar Flow Exhausted Clean Bench (Stainless Steel)
- Located in C11? UNCD seeding
- Applications: UNCD seeding
- 72” Open Wet Bench
- Clear eye front shield, half-hinged (resistant to methanol, IPA, acetone, acetonitrile)
- Light switch and fan switch
- Electrical out-lets
- Vacuum, compressed air and nitrogen ports
- N2 blow off guns with inline filter
- Timers
- Ultrasonic bathes
- Lower vented storage compartment with doors to store solvents.