Nanofabrication/Equipment/Laserwriter: Difference between revisions

Revision as of 18:38, November 23, 2020

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When requesting the use of this instrument, please provide the following information in your user proposal:

Sample materials, shapes, and sizes
Information about the intended patterns (shapes, sizes, distances, area coverage)
Number of samples to process or number of times of instrument usage

Questions? Please contact the instrument custodian before submitting your proposal.

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-==Laser Writer==
+==MLA==
 [[File:LaserWriter.JPG|right|400px| The instrument is located in the clean room, room C118]]
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 ===Features===
-* The laser radiation is sent onto the substrate through a final focusing lens placed in the upper part of the work chamber.
+.
-* The operator can choose among the following stop positions:
-  - Low resolution lens (NA limited to 0.12). This position is usually used for large field substrate inspection and not for writing, as the low NA value lens corresponds to a minimum achievable linewidth around 8 μm, which is too large for most applications.
-  - Medium resolution lens, with NA = 0.25. Besides surface inspection, this position can be used for writing. This medium resolution lens allows aminimum linewidth of about 4 μm.
-  - High resolution lens, with NA = 0.4. Besides surface inspection, this position is well suited for writing, because it allows a linewidth around 2 μm.
-  - Max resolution lens (NA = 0.65). In this position writing occurs with the maximum optical resolution (1 μm linewidth or better, limited by proximity effects in the photoresist).
-  - Spare position, for future optical accessories.
-  - Any gdsi or cif layout can be used.