Nanofabrication/Equipment/LVEBL: Difference between revisions
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(Created page with "==Raith 30 KV Ebeam Lithography System== The Raith is a 30KV electron beam lithography tool. right|400px ===Features=== * 30 kV electron beam colum...") |
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The Raith is a 30KV electron beam lithography tool. | The Raith is a 30KV electron beam lithography tool. | ||
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===Features=== | ===Features=== | ||
Latest revision as of 21:04, November 23, 2020
Raith 30 KV Ebeam Lithography System
The Raith is a 30KV electron beam lithography tool.
Features
- 30 kV electron beam column
The instrument is located in the CNM clean room
User Proposal Feasibility
When requesting the use of this instrument, please provide the following information in your user proposal:
- Sample materials, shapes, and sizes
- Information about the intended patterns (shapes, sizes, distances, area coverage)
- Important pattern quality requirements (if any)
- Number of samples to process or number of times of instrument usage