Nanofabrication/Equipment/AJA Oxide Sputter System: Difference between revisions
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== AJA Oxide Sputtering System== | == AJA Oxide Sputtering System== | ||
[[File: | [[File:IMG 0970.JPG|right|400px| The instrument is located in the clean room, ]] | ||
Latest revision as of 20:21, November 23, 2020
AJA Oxide Sputtering System
Features
The AJA oxide sputtering tool is a magnetron sputtering tool. The tool has 3” diameter targets, heating capabilities up to 800 °C across a 200 mm wafer, RF and DC sources, an automated load lock system, and computer automated control. This tool provides fast deposition rates for oxides (3 off-axis RF sputtering guns) because of the large target sizes and provides high fidelity oxide depositions because of the off-axis gun alignment. The tool has 2 on-axis DC sputtering guns for the deposition of metallic electrodes and adhesion layers.
User Proposal Feasibility
When requesting the use of this instrument, please provide the following information in your user proposal:
- Sample materials, shapes, and sizes
- Temperature compatibility of samples.
- Number of samples to process or number of times of instrument usage
Questions? Please contact the instrument custodian before submitting your proposal.