Nanofabrication/Equipment/FIB: Difference between revisions
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* 30 kV Sirion electron column, 500 V to 30 kV | * 30 kV Sirion electron column, 500 V to 30 kV | ||
* Secondary electron, limited backscattered electron, and secondary ion imaging | * Secondary electron, limited backscattered electron, and secondary ion imaging | ||
* Gas injection systems: platinum, tungsten, TEOS, | * Gas injection systems: platinum, tungsten, TEOS, carbon | ||
* Micromanipulator from Omniprobe: Autoprobe 200 | * Micromanipulator from Omniprobe: Autoprobe 200 | ||
* Raith Elphy lithography system set up for ion-beam lithography | * Raith Elphy lithography system set up for ion-beam lithography | ||
Latest revision as of 19:30, November 24, 2020
FEI Nova 600 NanoLab
The FEI Nova 600 NanoLab is a dual-beam instrument that integrates ion and electron beams for focused-ion-beam (FIB) and scanning electron microscope (SEM) functionality in one machine. Users can switch between the two beams for quick and accurate navigation and processing. Convergence of the SEM and FIB at short working distance allows precision milling, etching and deposition at high resolution.
Features
- 30 kV Sidewinder Ga+ ion column, 1.5 pA to 20 nA, 1 kV to 30 kV
- 30 kV Sirion electron column, 500 V to 30 kV
- Secondary electron, limited backscattered electron, and secondary ion imaging
- Gas injection systems: platinum, tungsten, TEOS, carbon
- Micromanipulator from Omniprobe: Autoprobe 200
- Raith Elphy lithography system set up for ion-beam lithography
The instrument is located in the CNM clean room.
User Proposal Feasibility
When requesting the use of this instrument, please provide the following information in your user proposal:
- Sample materials, shapes, and sizes
- Information about the intended patterns (shapes, sizes, distances, area coverage)
- Important pattern quality requirements (if any)
- Number of samples to process or number of times of instrument usage
Questions? Please contact the instrument custodian before submitting your proposal.