Nanofabrication/Equipment/Laserwriter: Difference between revisions
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[[File:LaserWriter.jpg|right|400px| The instrument is located in the clean room, room C118]] | |||
==Laser Writer== | ==Laser Writer== | ||
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===Features=== | ===Features=== | ||
. | * The laser radiation is sent onto the substrate through a final focusing lens placed in the upper part of the work chamber. | ||
* The operator can choose among the following stop positions: | |||
- Low resolution lens (NA limited to 0.12). This position is usually used for large field substrate inspection and not for writing, as the low NA value lens corresponds to a minimum achievable linewidth around 8 μm, which is too large for most applications. | |||
- Medium resolution lens, with NA = 0.25. Besides surface inspection, this position can be used for writing. This medium resolution lens allows aminimum linewidth of about 4 μm. | |||
- High resolution lens, with NA = 0.4. Besides surface inspection, this position is well suited for writing, because it allows a linewidth around 2 μm. | |||
- Max resolution lens (NA = 0.65). In this position writing occurs with the maximum optical resolution (1 μm linewidth or better, limited by proximity effects in the photoresist). | |||
- Spare position, for future optical accessories. | |||
- Any gdsi or cif layout can be used. | |||
Latest revision as of 19:46, November 23, 2020
Laser Writer
Features
- The laser radiation is sent onto the substrate through a final focusing lens placed in the upper part of the work chamber.
- The operator can choose among the following stop positions:
- Low resolution lens (NA limited to 0.12). This position is usually used for large field substrate inspection and not for writing, as the low NA value lens corresponds to a minimum achievable linewidth around 8 μm, which is too large for most applications. - Medium resolution lens, with NA = 0.25. Besides surface inspection, this position can be used for writing. This medium resolution lens allows aminimum linewidth of about 4 μm. - High resolution lens, with NA = 0.4. Besides surface inspection, this position is well suited for writing, because it allows a linewidth around 2 μm. - Max resolution lens (NA = 0.65). In this position writing occurs with the maximum optical resolution (1 μm linewidth or better, limited by proximity effects in the photoresist). - Spare position, for future optical accessories. - Any gdsi or cif layout can be used.
User Proposal Feasibility
When requesting the use of this instrument, please provide the following information in your user proposal:
- Sample materials, shapes, and sizes
- Information about the intended patterns (shapes, sizes, distances, area coverage)
- Number of samples to process or number of times of instrument usage
Questions? Please contact the instrument custodian before submitting your proposal.