Nanofabrication/Photoresist: Difference between revisions
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|SPR 220 series | |SPR 220 series | ||
| positive||3, 7 i-line||CD26 || Acetone/IPA or 1165 || yes|| yes|| || | | positive||3, 7 i-line photoresist||CD26 || Acetone/IPA or 1165 || yes|| yes|| || https://kayakuam.com/wp-content/uploads/2019/10/SPR_220_DATA_SHEET_RH.pdf | ||
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Revision as of 18:59, November 24, 2020
- Kayakuam :[1] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
- ZEON :ZEON is the supplier of our ZEP photoresists
| Resist Name | Photoresist Type | Tk/Flavor | Developer | Strippers | Optical (MA6, Stepper) | Laser Writer | EBEAM Lith. (JEOL, RAITH) | Process Data Sheet | |
|---|---|---|---|---|---|---|---|---|---|
| 1800 Series | positive | 1805, 1813, 1818 | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf | ||
| AZ P4620 | positive | 1700 - 2600 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| SPR 220 series | positive | 3, 7 i-line photoresist | CD26 | Acetone/IPA or 1165 | yes | yes | https://kayakuam.com/wp-content/uploads/2019/10/SPR_220_DATA_SHEET_RH.pdf | ||
| SPR 955 | positive | nm | CD26 | Acetone/IPA or 1165 | yes | yes | |||
| LOR 3A, 30B | positive | nm | CD26 | Acetone/IPA or 1165 | yes | yes | |||
| AZ nLOF 2000 | negative | 351 Dev: H20 (1:3) ratios can vary | Acetone/IPA or 1165 | yes | |||||
| ma-N 1400 | negative | Ma-D 355 | Acetone/IPA or 1165 | yes | |||||
| SU8 | negative | SU8 Developer | Acetone/IPA or 1165 | yes | yes (MLA) | yes | |||
| SU8 3000 | negative | SU8 Developer | Acetone/IPA or 1165 | yes | yes (MLA) | yes | |||
| ZEP | positive | MIBK: IPA 1:3 | Acetone/IPA or 1165 | yes | |||||
| PMMA 495 | positive | A2, A3 | MIBK: IPA 1:3 | Acetone/IPA or 1165 | yes | ||||
| PMMA 950 | positive | A2, A3, A4, A8, A11 | MIBK: IPA 1:3 | Acetone/IPA or 1165 | yes |