Nanofabrication/Photoresist: Difference between revisions

From CNM Wiki
Jump to navigation Jump to search
No edit summary
No edit summary
Line 10: Line 10:
{| class="wikitable sortable" style="margin: 1em 1em 1em 1em"  cellpadding=5px
{| class="wikitable sortable" style="margin: 1em 1em 1em 1em"  cellpadding=5px
|- style="background:lightgrey" align=center
|- style="background:lightgrey" align=center
! Resist Name !! Photoresist Type !! PR Thickness!! Developer!! Strippers!! Optical (MA6, Stepper) !! Laser Writer!! EBEAM Lith. (JEOL, RAITH)!! Process Data Sheet
! Resist Name !! Photoresist Type !! Tk/Flavor!! Developer!! Strippers!! Optical (MA6, Stepper) !! Laser Writer!! EBEAM Lith. (JEOL, RAITH)!! Process Data Sheet
|-
|-
| 1800 Series
| 1800 Series
| positive || 1805, 1813, 1818|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| ||  
| positive || 1805, 1813, 1818|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| || https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf
|-
|-


| 1811
 
| positive || 1100-1700 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  || yes|| yes|| || 
   
|-
| 1813
| positive || 1300 - 1800 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|||| 
|-
| 1818
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| || 
|-
| 1827
| positive|| 2700- nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| || 
|-
|-
|AZ P4620
|AZ P4620
Line 58: Line 49:
| positive|| || MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
| positive|| || MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
|-
|-
| PMMA 495 - A2, A3
| PMMA 495
| positive||A2, A3||| MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
| positive||A2, A3||| MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
|-
|-
| PMMA 950 - A2, A3, A4, A8, A11
| PMMA 950  
| positive|| || MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
| positive||A2, A3, A4, A8, A11|| MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
|}
|}

Revision as of 18:56, November 24, 2020


Kayakuam :[1] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
ZEON :ZEON is the supplier of our ZEP photoresists


Resist Name Photoresist Type Tk/Flavor Developer Strippers Optical (MA6, Stepper) Laser Writer EBEAM Lith. (JEOL, RAITH) Process Data Sheet
1800 Series positive 1805, 1813, 1818 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf
AZ P4620 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
SPR 220 - 3 positive nm CD26 Acetone/IPA or 1165 yes yes
SPR 220 - 7 positive nm CD26 Acetone/IPA or 1165 yes yes
SPR 955 positive nm CD26 Acetone/IPA or 1165 yes yes
LOR 3A, 30B positive nm CD26 Acetone/IPA or 1165 yes yes
AZ nLOF 2000 negative 351 Dev: H20 (1:3) ratios can vary Acetone/IPA or 1165 yes
ma-N 1400 negative Ma-D 355 Acetone/IPA or 1165 yes
SU8 negative SU8 Developer Acetone/IPA or 1165 yes yes (MLA) yes
SU8 3000 negative SU8 Developer Acetone/IPA or 1165 yes yes (MLA) yes
ZEP positive MIBK: IPA 1:3 Acetone/IPA or 1165 yes
PMMA 495 positive A2, A3 MIBK: IPA 1:3 Acetone/IPA or 1165 yes
PMMA 950 positive A2, A3, A4, A8, A11 MIBK: IPA 1:3 Acetone/IPA or 1165 yes