Nanofabrication/Photoresist: Difference between revisions

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:Microchem :[http://www.microchem.com/ Microchem] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
:Microchem :[http://www.microchem.com/ Microchem] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.


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| 1827
| 1827
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| || ||  [[media:somename.pdf|1800]]
|-
|AZ P4620
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| || ||  [[media:somename.pdf|1800]]
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| || ||  [[media:somename.pdf|1800]]
|-
|-

Revision as of 22:39, November 19, 2020


Microchem :Microchem is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
ZEON :ZEON is the supplier of our ZEP photoresists


Resist Name Photoresist Type PR Thickness Developer Strippers SUSS MA6 Laser Writer Raith JEOL Process Data Sheet
1805 positive 400 - 600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes 1800
1811 positive 400 - 600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes 1800
1813 positive 1300 - 1800 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes 1800
1818 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes 1800
1827 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes 1800
AZ P4620 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes 1800
PMMA positive Acetone/IPA or 1165 yes yes PMMA