Nanofabrication/Photoresist: Difference between revisions

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| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| ||  
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA  or  1165  ||  yes|| yes|| ||  
|-
|-
|SPR 220 - 3
|SPR 220 series
| positive||nm||CD26 || Acetone/IPA  or  1165  ||  yes|| yes|| ||  
| positive||3, 7 i-line||CD26 || Acetone/IPA  or  1165  ||  yes|| yes|| ||  
|-
|-
|SPR 220 - 7
 
| positive||nm||CD26 || Acetone/IPA  or  1165  ||  yes|| yes|| ||
|-
|-
|SPR 955
|SPR 955

Revision as of 18:58, November 24, 2020


Kayakuam :[1] is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
ZEON :ZEON is the supplier of our ZEP photoresists


Resist Name Photoresist Type Tk/Flavor Developer Strippers Optical (MA6, Stepper) Laser Writer EBEAM Lith. (JEOL, RAITH) Process Data Sheet
1800 Series positive 1805, 1813, 1818 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes https://kayakuam.com/wp-content/uploads/2019/09/S1800-G2.pdf
AZ P4620 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
SPR 220 series positive 3, 7 i-line CD26 Acetone/IPA or 1165 yes yes
SPR 955 positive nm CD26 Acetone/IPA or 1165 yes yes
LOR 3A, 30B positive nm CD26 Acetone/IPA or 1165 yes yes
AZ nLOF 2000 negative 351 Dev: H20 (1:3) ratios can vary Acetone/IPA or 1165 yes
ma-N 1400 negative Ma-D 355 Acetone/IPA or 1165 yes
SU8 negative SU8 Developer Acetone/IPA or 1165 yes yes (MLA) yes
SU8 3000 negative SU8 Developer Acetone/IPA or 1165 yes yes (MLA) yes
ZEP positive MIBK: IPA 1:3 Acetone/IPA or 1165 yes
PMMA 495 positive A2, A3 MIBK: IPA 1:3 Acetone/IPA or 1165 yes
PMMA 950 positive A2, A3, A4, A8, A11 MIBK: IPA 1:3 Acetone/IPA or 1165 yes