Nanofabrication/Photoresist: Difference between revisions

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| negative|| || SU8 Developer|| Acetone/IPA  or  1165  || |yes|| |yes (MLA) ||yes||||   
| negative|| || SU8 Developer|| Acetone/IPA  or  1165  || |yes|| |yes (MLA) ||yes||||   
|-
|-
| PMMA
| PMMA 495 - A2, A3
| positive|| || MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
| positive|| || MIBK: IPA 1:3|| Acetone/IPA  or  1165  || || || |yes||||   
|}
|}

Revision as of 01:37, November 20, 2020


Microchem :Microchem is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
ZEON :ZEON is the supplier of our ZEP photoresists


Resist Name Photoresist Type PR Thickness Developer Strippers Optica (MA6, Stepper) Laser Writer EBEAM Lith. (JEOL, RAITH) Process Data Sheet
1805 positive 400 - 600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
1811 positive 400 - 600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
1813 positive 1300 - 1800 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
1818 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
1827 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
AZ P4620 positive 1700 - 2600 nm 351 Dev: H20 (1:4) ratios can vary Acetone/IPA or 1165 yes yes
SPR 220 - 3 positive nm CD26 Acetone/IPA or 1165 yes yes
SPR 220 - 7 positive nm CD26 Acetone/IPA or 1165 yes yes
SPR 955 positive nm CD26 Acetone/IPA or 1165 yes yes
PMMA positive MIBK: IPA 1:3 Acetone/IPA or 1165 yes
SU8 negative SU8 Developer Acetone/IPA or 1165 yes yes (MLA) yes
SU8 3000 negative SU8 Developer Acetone/IPA or 1165 yes yes (MLA) yes
PMMA 495 - A2, A3 positive MIBK: IPA 1:3 Acetone/IPA or 1165 yes