Nanofabrication/Photoresist: Difference between revisions
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! Resist Name !! Photoresist Type !! PR Thickness!! Developer!! Strippers!! | ! Resist Name !! Photoresist Type !! PR Thickness!! Developer!! Strippers!! Optica (MA6, Stepper) !! Laser Writer!! EBEAM Lith. (JEOL, RAITH)!! Process Data Sheet | ||
|- | |- | ||
| 1805 | | 1805 | ||
| positive || 400 - 600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | | positive || 400 - 600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | ||
|- | |- | ||
| 1811 | | 1811 | ||
| positive || 400 - 600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes | | positive || 400 - 600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | ||
|- | |- | ||
| 1813 | | 1813 | ||
| positive || 1300 - 1800 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes | | positive || 1300 - 1800 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|||| | ||
|- | |- | ||
| 1818 | | 1818 | ||
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes | | positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | ||
|- | |- | ||
| 1827 | | 1827 | ||
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | | positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | ||
|- | |- | ||
|AZ P4620 | |AZ P4620 | ||
| positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | | positive|| 1700 - 2600 nm|| 351 Dev: H20 (1:4) ratios can vary || Acetone/IPA or 1165 || yes|| yes|| || | ||
|- | |- | ||
|SPR 220 - 3 | |SPR 220 - 3 | ||
| positive||nm||CD26 || Acetone/IPA or 1165 || yes|| yes|| || || | | positive||nm||CD26 || Acetone/IPA or 1165 || yes|| yes|| || | ||
|- | |||
|SPR 220 - 7 | |||
| positive||nm||CD26 || Acetone/IPA or 1165 || yes|| yes|| || | |||
|- | |||
|SPR 955 | |||
| positive||nm||CD26 || Acetone/IPA or 1165 || yes|| yes|| || | |||
|- | |- | ||
| PMMA | | PMMA | ||
| positive|| || || Acetone/IPA or 1165 || || || |yes|| | | positive|| || MIBK: IPA 1:3|| Acetone/IPA or 1165 || || || |yes|||| | ||
|} | |} | ||
Revision as of 01:25, November 20, 2020
- Microchem :Microchem is the supplier of our Shipley 1800's, MicroResist Technology, SU8, LOR, SPR, and PMMA photoresists, developers, and strippers.
- ZEON :ZEON is the supplier of our ZEP photoresists
| Resist Name | Photoresist Type | PR Thickness | Developer | Strippers | Optica (MA6, Stepper) | Laser Writer | EBEAM Lith. (JEOL, RAITH) | Process Data Sheet | |
|---|---|---|---|---|---|---|---|---|---|
| 1805 | positive | 400 - 600 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| 1811 | positive | 400 - 600 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| 1813 | positive | 1300 - 1800 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| 1818 | positive | 1700 - 2600 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| 1827 | positive | 1700 - 2600 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| AZ P4620 | positive | 1700 - 2600 nm | 351 Dev: H20 (1:4) ratios can vary | Acetone/IPA or 1165 | yes | yes | |||
| SPR 220 - 3 | positive | nm | CD26 | Acetone/IPA or 1165 | yes | yes | |||
| SPR 220 - 7 | positive | nm | CD26 | Acetone/IPA or 1165 | yes | yes | |||
| SPR 955 | positive | nm | CD26 | Acetone/IPA or 1165 | yes | yes | |||
| PMMA | positive | MIBK: IPA 1:3 | Acetone/IPA or 1165 | yes |