Mirror system: Difference between revisions
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===Alignment of the mirror system and WBS=== | |||
The mirror system allows selection of an energy range by use of different reflective stripes (Si, Cr, Pt), fine tuning of the energy range (and thereby high-harmonics rejection) by changing the grazing angle, and change of propagation angle of the reflected beam in the horizontal direction by change of the pitch of the second mirror. | |||
The White Beam Slit (WBS) must always be set to limit the size of the incident beam and protect the mirror system from damaging heat load. | |||
Open the [[media:Alignment_Nanoprobe_Mirror_4oct08.pdf|description of Alignment procedure.]] | |||
[[Category:XMG]][[Category:Controls]][[Category:Beamline]] | [[Category:XMG]][[Category:Controls]][[Category:Beamline]] | ||
Revision as of 17:26, April 14, 2009
Back to X-Ray Microscopy
Alignment of the mirror system and WBS
The mirror system allows selection of an energy range by use of different reflective stripes (Si, Cr, Pt), fine tuning of the energy range (and thereby high-harmonics rejection) by changing the grazing angle, and change of propagation angle of the reflected beam in the horizontal direction by change of the pitch of the second mirror.
The White Beam Slit (WBS) must always be set to limit the size of the incident beam and protect the mirror system from damaging heat load.
Open the description of Alignment procedure.