https://wiki.anl.gov/wiki_cnm/index.php?action=history&feed=atom&title=Nanofabrication%2FEquipment%2F_Metal_Sputter_System 2026-06-03T23:26:17Z Revision history for this page on the wiki MediaWiki 1.43.8 https://wiki.anl.gov/wiki_cnm/index.php?title=Nanofabrication/Equipment/_Metal_Sputter_System&diff=6677&oldid=prev 2020-11-23T20:27:47Z

<p>Created page with &quot;== AJA Sputter System (metals)== <a href="/cnm/File:IMG_0974.JPG" title="File:IMG 0974.JPG">right|400px| The instrument is located in the clean room, </a> File:Smallaja2.JPG|right|400px| The instrument is located...&quot;</p> <p><b>New page</b></p><div>== AJA Sputter System (metals)==<br /> <br /> [[File:IMG 0974.JPG|right|400px| The instrument is located in the clean room, ]]<br /> [[File:Smallaja2.JPG|right|400px| The instrument is located in the clean room, ]]<br /> <br /> <br /> ===Features===<br /> The AJA general sputtering tool is an on-axis magnetron sputtering tool. The tool has 3, 2” diameter targets with multiple degrees of freedom (tilt, z-axis position), heating capabilities up to 800 °C across a 150 mm wafer, 1-RF and 3-DC sources, a load lock system, and computer automated control. This tool provides fast deposition rates for both metals (DC sputtering) and oxides (RF sputtering) because of the 2” target sizes.<br /> ===User Proposal Feasibility===<br /> <br /> When requesting the use of this instrument, please provide the following information in your user proposal:<br /> <br /> * Sample materials, shapes, and sizes<br /> * Temperature compatibility of samples.<br /> * Number of samples to process or number of times of instrument usage<br /> <br /> Questions? Please contact the instrument custodian before submitting your proposal.</div>

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